Specific Process Knowledge/Etch/Wet Platinum Etch: Difference between revisions
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*H<sub>2</sub>O : HCl : HNO<sub>3</sub> (8 : 7 : 1) at 85 °C (note: etching starts at 70 C, 170nm etched in 5 min 70 C-85 C)* Nisoer July 2022 | *H<sub>2</sub>O : HCl : HNO<sub>3</sub> (8 : 7 : 1) at 85 °C (note: etching starts at 70 C, 170nm etched in 5 min 70 C-85 C)* Nisoer July 2022 | ||
'''You have to be very careful when you work with this etch. It can generate nitrous | '''You have to be very careful when you work with this etch. It can generate nitrous gasses which are very toxic!!''' | ||
At this moment we do not have any information on the etch rate. You should be aware that this wet etch will also etch gold and it is not possible to use any masking material, it is used as a stripper. | At this moment we do not have any information on the etch rate. You should be aware that this wet etch will also etch gold and it is not possible to use any masking material, it is used as a stripper. | ||