Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Exposure dose== | ==Exposure dose== | ||
[[Image:AZ spectral sensitivity.gif|400x400px|thumb|Spectral sensitivity of AZ resists represented as optical absorption. | [[Image:AZ spectral sensitivity.gif|400x400px|thumb|Spectral sensitivity of AZ resists represented as optical absorption.] | ||
'''Data represent dose-defocus tests on Si using optical autofocus unless otherwise stated''' | '''Data represent dose-defocus tests on Si using optical autofocus unless otherwise stated''' | ||