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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Line 116: Line 116:
| Fast
| Fast
| 80 mJ/cm<sup>2</sup>
| 80 mJ/cm<sup>2</sup>
| -4
| -2
| 1.5 µm
| 1.5 µm
| Dev: SP60s
| Dev: SP60s
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