Specific Process Knowledge/Thin film deposition/Deposition of Carbon: Difference between revisions
No edit summary |
No edit summary |
||
Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition of Carbon click here]''' | ||
== Deposition of Carbon == | == Deposition of Carbon == |
Revision as of 19:11, 20 December 2022
Feedback to this page: of Carbon click here
Deposition of Carbon
Carbon can be deposited by DC-sputtering method. So far the process has been tested only using Sputter-System (Lesker):