Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
Line 69: Line 69:
{| id="linkTable" border="1" cellpadding="0" cellspacing="0" style="text-align:center;"
{| id="linkTable" border="1" cellpadding="0" cellspacing="0" style="text-align:center;"
! class="hideImage" style="display:none"| Front Image
! class="hideImage" style="display:none"| Front Image
! style="display:none"|-
! style="display:none"|-
! style="display:none"|-
|-
|-
! class="hideImage" width="150" height="180px"| Clean your sample[[file:jehanClean.png|130px|frameless ]]  
! class="hideImage" width="150" height="180px"| Clean your sample[[file:jehanClean.png|130px|frameless ]]  
! class="hideImage" width="150" | Dry your sample [[file:jehanDry.png|130px|frameless  ]]  
! class="hideImage" width="150" | Dry your sample [[file:jehanDry.png|130px|frameless  ]]  
! class="hideImage" width="150" | Create a thin film on your sample [[file:jehanfilm.png|130px|frameless  ]]
|-
|-
! class="hideImage" width="150" height="180px"| Thermal treatment of your sample [[file:jehanThermal.png|130px|frameless ]]
! class="hideImage" width="150" height="180px"| Thermal treatment of your sample [[file:jehanThermal.png|130px|frameless ]]
! class="hideImage" width="150" | Make a mask on your sample[[file:jehanmask.png|130px|frameless ]]
! class="hideImage" width="150" | Make a mask on your sample[[file:jehanmask.png|130px|frameless ]]
! class="hideImage" width="150" | Transfer pattern to your sample [[file:jehanTransfer.png|130px|frameless ]]
|-
|-
|}
|}
Line 135: Line 132:
|-
|-
|}
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="600px"
 
!colspan="3" style="text-align:left;" | [[image:Create a film on your sample.png|x100px|Create a layer/film on your sample]] Create a layer/film on your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|[[Specific Process Knowledge/Thermal Process/Oxidation| Thermal Process/Oxidation]]
|Thermal oxidation
|Thermal SiO2
|-
|rowspan="8" valign="top"|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]]
|Sputter deposition
|Metals: Al, Ti, Cr, Co, Ni, Cu, Mo, Pd, Ag, Sn, Ta, W, Pt, Au, Fe, Mg, Nb, Ru <br>
Semiconductors: Si, Ge, ZnO <br>
Oxides: SiO<sub>2</sub>, ITO, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, MgO, Ta<sub>2</sub>O<sub>5</sub> Cr<sub>2</sub>O<sub>3</sub><br>
Transparent Conducting Oxides: ITO, AZO<br>
Alloys: TiW, NiCr, AlTi, NiV, AlCu, CoFe, CuTi, FeMn, MnIr, NiCo, NiFe, YSZ <br>
|-
|Thermal evaporation
|Al, Ge, Ag
|-
|E-beam evaporation
|Metals: Ti, Cr, Al, Ni, Pt, Au, Mo, Nb, Pd, Ag, Cu, W, Ta <br>
Semiconductors: Si, Ge <br>
Oxides: SiO<sub>2</sub>, TiO<sub>2</sub> <br>
Alloys: NiCr, TiAl
|-
|LPCVD
|Si<sub>3</sub>N<sub>4</sub>, SRN, SiO<sub>2</sub>, Si (poly and amorph)
|-
|PECVD
|Si<sub>3</sub>N<sub>4</sub>, SiO<sub>2</sub>, PBSG
|-
|MVD
|FDTS
|-
|Electroplating
|Ni
|-
|Epitaxial growth /MOCVD
|Al, As, Ga, In, P. doping: Si, Zn
|-
|rowspan="2" valign="top"| [[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]]
|Spin coating
|resists, polymers
|-
|Spray coating
|resists, polymers
|-
|}


{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
Line 238: Line 185:
|Imprinting
|Imprinting
|Polymers
|Polymers
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Transfer mask pattrn to your sample.png|x100px|Transfer mask pattern to your sample]] Transfer mask pattern to your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="2" valign="top"|[[Specific Process Knowledge/Etch| Etch]]
|Wet etch
|Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs
|-
|Dry etch
|Any material
|-
|[[Specific Process Knowledge/Lithography/LiftOff| Lithography/Lift-off]]
|Lift-off
|Most materials
|-
|-
|}
|}

Revision as of 15:25, 15 December 2022

The DREM processes

DREM 2kW micro

DREM 2kW micro
Recipe General Pressure Gases Generators Matching Tem- pera- ture Results
C4F8 SF6 O2 Ar Coil Platen Coil Platen
Platen Stb S/E Dp Et Cyc Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Runs Keywords
U/D H/L D B M D B M D B M D B M D B M D B M D B M L T L T L T L T
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 8
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 0
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 1
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 -19
0 Home matching  
General Time Pressure Gas " >Power Matching Miscellaneous
Setting 90t 7T sulf yes, lots lit na


Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser

-
Clean your sample Dry your sample
Thermal treatment of your sample Make a mask on your sample


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/DREM&oldid=41947"