Specific Process Knowledge/Thin film deposition/Deposition of Tantalum: Difference between revisions
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Tantalum can be deposited by e-beam evaporation and sputter deposition. In the chart below you can compare the different deposition equipment. | Tantalum can be deposited by e-beam evaporation and sputter deposition. In the chart below you can compare the different deposition equipment. | ||
== | ==Sputtering of Tantalum== | ||
You can read more about Ta sputter deposition using Sputter-System(Lesker) | You can read more about Ta sputter deposition using Sputter-System(Lesker) | ||
*[[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Tantalum/Sputtering of Ta|Sputtering of Ta in Sputter-System (Lesker)]]. | *[[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Tantalum/Sputtering of Ta|Sputtering of Ta in Sputter-System (Lesker)]]. | ||
== E-beam evaporation of Tantalum == | == E-beam evaporation of Tantalum == | ||