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| ==Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser== | | ==Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser== |
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| ! class="hideImage" style="display:none"| Front Image
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| ! class="hideImage" width="150" | Dope your sample [[file:jehanDope.png|10px|frameless ]]
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| ! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample
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| !Entry page in LabAdviser
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| !Techniques
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| !Materials
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| |rowspan="5" valign="top" |[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]]
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| |Soap Sonic
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| |Removes dust and particles
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| |7-up & Piranha
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| |Removes traces of organics and alkali ions
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| |RCA
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| |Two step process to remove traces of organics and metals
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| |5% HF
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| |Removes native oxide
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| |IMEC
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| |Removing dust, traces of organics and alkali ions and slightly polish the surface.
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| Make the surface hydrophillic
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| !colspan="3" style="text-align:left;" | [[image:Dope your sample.png|x100px|Dope your sample]] Dope your sample
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| !Entry page in LabAdviser
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| !Techniques
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| !Materials
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| |rowspan="5" valign="top"| [[Specific Process Knowledge/Doping|Doping]]
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| |Ion implant
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| |e.g. P, B, As
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| |[[Specific Process Knowledge/Thin film deposition/PECVD| PECVD]]
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| |Deposition of SiO2 or Si3N4 doped with P,B and Ge
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| |[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|LPCVD ]]
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| |Deposition of PolySi doped with B or P
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| |[[Specific Process Knowledge/Thermal Process/Dope with Boron|Predeposition and drive-in]]
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| |Doping Silicon wafers with boron
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| |[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Predeposition and drive-in]]
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| |Doping Silicon wafers with phosphorus
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| <br>
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