Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions

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==Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser==
==Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser==
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{| id="linkTable" border="1" cellpadding="0" cellspacing="0" style="text-align:center;"
! class="hideImage" style="display:none"| Front Image
 
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! class="hideImage" width="150" | Dope your sample [[file:jehanDope.png|10px|frameless ]]
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{| class="wikitable hideable hidden" border="1" cellspacing="0" cellpadding="0"  align="left" width="430px"
! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample
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!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="5" valign="top" |[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]]
|Soap Sonic
|Removes dust and particles
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|7-up & Piranha
|Removes traces of organics and alkali ions
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|RCA
|Two step process to remove traces of organics and metals
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|5% HF
|Removes native oxide
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|IMEC
|Removing dust, traces of organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
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{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Dope your sample.png|x100px|Dope your sample]] Dope your sample
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|-
!Entry page in LabAdviser
!Techniques
!Materials
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|rowspan="5" valign="top"| [[Specific Process Knowledge/Doping|Doping]]
|Ion implant
|e.g. P, B, As 
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|[[Specific Process Knowledge/Thin film deposition/PECVD| PECVD]]
|Deposition of SiO2 or Si3N4 doped with P,B and Ge
|-
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|LPCVD ]]
|Deposition of PolySi doped with B or P
|-
|[[Specific Process Knowledge/Thermal Process/Dope with Boron|Predeposition and drive-in]]
|Doping Silicon wafers with boron
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|[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Predeposition and drive-in]]
|Doping Silicon wafers with phosphorus
 
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Revision as of 15:20, 15 December 2022

The DREM processes

DREM 2kW micro

DREM 2kW micro
Recipe General Pressure Gases Generators Matching Tem- pera- ture Results
C4F8 SF6 O2 Ar Coil Platen Coil Platen
Platen Stb S/E Dp Et Cyc Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Runs Keywords
U/D H/L D B M D B M D B M D B M D B M D B M D B M L T L T L T L T
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 8
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 0
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 1
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 -19
0 Home matching  
General Time Pressure Gas " >Power Matching Miscellaneous
Setting 90t 7T sulf yes, lots lit na


Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser

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