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Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions

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Jmli (talk | contribs)
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|Removing dust, traces of organics and alkali ions and slightly polish the surface.  
|Removing dust, traces of organics and alkali ions and slightly polish the surface.  
Make the surface hydrophillic
Make the surface hydrophillic
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{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x130px|Dry your sample]] Dry your sample
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!Entry page in LabAdviser
!Techniques
!Materials
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|rowspan="4" valign="top" |[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]]
|Spin dryers
|Whole wafers
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|Critial point dryer
|Sensitive wafers
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|Ethanol fume drying
|Sensitive wafers
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|N2 blow drying
|N2 pistols
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|-
|}
|}