Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
No edit summary
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
Line 60: Line 60:
|miscbox=na
|miscbox=na
}}
}}
==Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser==
{| style="color: black;vertical-align:top" width="100%" border=0 cellpadding="4" cellspacing="0"
| colspan="2" |
|-
| style="width: 50%; vertical-align:top;"|
{| id="linkTable" border="1" cellpadding="0" cellspacing="0" style="text-align:center;"
! class="hideImage" style="display:none"| Front Image
! style="display:none"|-
! style="display:none"|-
! style="display:none"|-
|-
! class="hideImage" width="150" | Dope your sample [[file:jehanDope.png|130px|frameless ]]
|-
|}
| style="color:black; width: 50%; vertical-align: top;"|
{| class="wikitable hideable hidden" border="1" cellspacing="0" cellpadding="0"  align="left" width="400px" style="float:right;"
! style="text-align:right;" | [[image:DUV6.jpg|center|400px]]
|-
|}
| style="color:black; width: 50%; vertical-align: top"|
{| class="wikitable hideable hidden" border="1" cellspacing="0" cellpadding="0"  align="left" width="430px"
! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="5" valign="top" |[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]]
|Soap Sonic
|Removes dust and particles
|-
|7-up & Piranha
|Removes traces of organics and alkali ions
|-
|RCA
|Two step process to remove traces of organics and metals
|-
|5% HF
|Removes native oxide
|-
|IMEC
|Removing dust, traces of organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x130px|Dry your sample]] Dry your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="4" valign="top" |[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]]
|Spin dryers
|Whole wafers
|-
|Critial point dryer
|Sensitive wafers
|-
|Ethanol fume drying
|Sensitive wafers
|-
|N2 blow drying
|N2 pistols
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Dope your sample.png|x100px|Dope your sample]] Dope your sample
|-
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="5" valign="top"| [[Specific Process Knowledge/Doping|Doping]]
|Ion implant
|e.g. P, B, As 
|-
|[[Specific Process Knowledge/Thin film deposition/PECVD| PECVD]]
|Deposition of SiO2 or Si3N4 doped with P,B and Ge
|-
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|LPCVD ]]
|Deposition of PolySi doped with B or P
|-
|[[Specific Process Knowledge/Thermal Process/Dope with Boron|Predeposition and drive-in]]
|Doping Silicon wafers with boron
|-
|[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Predeposition and drive-in]]
|Doping Silicon wafers with phosphorus
|-
|}
|-
|}
----
<br>

Revision as of 15:29, 13 December 2022

The DREM processes

DREM 2kW micro

DREM 2kW micro
Recipe General Pressure Gases Generators Matching Tem- pera- ture Results
C4F8 SF6 O2 Ar Coil Platen Coil Platen
Platen Stb S/E Dp Et Cyc Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Runs Keywords
U/D H/L D B M D B M D B M D B M D B M D B M D B M L T L T L T L T
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 8
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 0
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 1
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 -19
0 Home matching  
General Time Pressure Gas " >Power Matching Miscellaneous
Setting 90t 7T sulf yes, lots lit na


Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser

- - -
Dope your sample





Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/DREM&oldid=41875"