Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions
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==Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser== | |||
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{| id="linkTable" border="1" cellpadding="0" cellspacing="0" style="text-align:center;" | |||
! class="hideImage" style="display:none"| Front Image | |||
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! class="hideImage" width="150" | Dope your sample [[file:jehanDope.png|130px|frameless ]] | |||
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{| class="wikitable hideable hidden" border="1" cellspacing="0" cellpadding="0" align="left" width="400px" style="float:right;" | |||
! style="text-align:right;" | [[image:DUV6.jpg|center|400px]] | |||
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! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample | |||
|- | |||
!Entry page in LabAdviser | |||
!Techniques | |||
!Materials | |||
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|rowspan="5" valign="top" |[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]] | |||
|Soap Sonic | |||
|Removes dust and particles | |||
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|7-up & Piranha | |||
|Removes traces of organics and alkali ions | |||
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|RCA | |||
|Two step process to remove traces of organics and metals | |||
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|5% HF | |||
|Removes native oxide | |||
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|IMEC | |||
|Removing dust, traces of organics and alkali ions and slightly polish the surface. | |||
Make the surface hydrophillic | |||
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{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2" align="left" width="430px" | |||
!colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x130px|Dry your sample]] Dry your sample | |||
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!Entry page in LabAdviser | |||
!Techniques | |||
!Materials | |||
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|rowspan="4" valign="top" |[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]] | |||
|Spin dryers | |||
|Whole wafers | |||
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|Critial point dryer | |||
|Sensitive wafers | |||
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|Ethanol fume drying | |||
|Sensitive wafers | |||
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|N2 blow drying | |||
|N2 pistols | |||
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{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2" align="left" width="430px" | |||
!colspan="3" style="text-align:left;" | [[image:Dope your sample.png|x100px|Dope your sample]] Dope your sample | |||
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|- | |||
!Entry page in LabAdviser | |||
!Techniques | |||
!Materials | |||
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|rowspan="5" valign="top"| [[Specific Process Knowledge/Doping|Doping]] | |||
|Ion implant | |||
|e.g. P, B, As | |||
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|[[Specific Process Knowledge/Thin film deposition/PECVD| PECVD]] | |||
|Deposition of SiO2 or Si3N4 doped with P,B and Ge | |||
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|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|LPCVD ]] | |||
|Deposition of PolySi doped with B or P | |||
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|[[Specific Process Knowledge/Thermal Process/Dope with Boron|Predeposition and drive-in]] | |||
|Doping Silicon wafers with boron | |||
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|[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Predeposition and drive-in]] | |||
|Doping Silicon wafers with phosphorus | |||
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