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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Slow etch: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,304 edits
Line 19: Line 19:


|-
|-
|He flow [sccm]
|H2 flow [sccm]
|0
|15


|-
|-
|CF<sub>4</sub> flow [sccm]
|CF<sub>4</sub> flow [sccm]
|45
|40


|-
|-
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