Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
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<gallery caption="Etching lines in 100nm Cr with the Cr etch for 3:20 min with pressure of 30 mTorr with 300 nm DUV resist ''BGHE@Nanolab Oct 2022''" perrow="5" widths="400px" heights="300px"> | |||
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