Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
Appearance
| Line 90: | Line 90: | ||
*Clearly too little resist for this etch | *Clearly too little resist for this etch | ||
<gallery> | <gallery caption="After Cr etch with recipe Cr_AS_13 for 3min20s" widths="300px" heights="225px" perrow="4"> | ||
Image:S0338_51_05.jpg | Image:S0338_51_05.jpg | ||