Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
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! Recipe !! Pressure [mTorr] !! Coil power [W] !! Platen power [W] !! Total Flow Cl2+O2 [sccm] !! O2% !! Temp !! !! Time [s] !! CSAR etch rate [nm/min] !! CSAR rate w bond !! !! Etch rate [nm/min] !! Selectivity !! !! coil load !! coil tune !! plat load !! plat tune !! Comment | ! Recipe !! Pressure [mTorr] !! Coil power [W] !! Platen power [W] !! Total Flow Cl2+O2 [sccm] !! O2% !! Temp !! !! Time [s] !! CSAR etch rate [nm/min] !! CSAR rate w bond !! !! Etch rate [nm/min] !! Selectivity !! !! coil load !! coil tune !! plat load !! plat tune !! Comment | ||
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! | ! Cr_AS_13 | ||
| 10 || 300 || 15 || 30 || 23.33 || 20 || || 28 || 100.71 || || || 42.86 || 0.43 || || || || || || This recipe was chosen over no. 12 because it did not need a large over etch of the Cr (no foot). | | 10 || 300 || 15 || 30 || 23.33 || 20 || || 28 || 100.71 || || || 42.86 || 0.43 || || || || || || This recipe was chosen over no. 12 because it did not need a large over etch of the Cr (no foot). | ||
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