Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with ICP Metal: Difference between revisions
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==Al2O3 etching by sanvis@nanolab [[Image:section under construction.jpg|70px]]== | ==Al2O3 etching by sanvis@nanolab [[Image:section under construction.jpg|70px]]== | ||
{| border="1" cellspacing="2" cellpadding="2" | |||
|-style="background:Black; color:White" | |||
! Parameter | |||
|Nanoscale Al2O3 etch | |||
|Microscale Al2O3 etch | |||
|- | |||
|Coil Power [W] | |||
|300 | |||
|500 | |||
|- | |||
|Platen Power [W] | |||
|15 | |||
|70 | |||
|- | |||
|Platen temperature [<sup>o</sup>C] | |||
|0 | |||
|0 | |||
|- | |||
|BCl3 flow [sccm] | |||
|20 | |||
|40 | |||
|- | |||
|Cl<sub>2</sub> flow [sccm] | |||
|7 | |||
|15 | |||
|- | |||
|Pressure [mTorr] | |||
|1.2 | |||
|3.0 | |||
|- | |||
|} | |||
{| border="2" cellspacing="2" cellpadding="3" | |||
|-style="background:DarkGray; color:White" | |||
!Material to be etched | |||
!Nanoscale Al2O3 etch | |||
!Microscale Al2O3 etch | |||
|- | |||
|Etch rate | |||
|'''6.25 nm/min on 6" wafer''', ''Summer sanvis@nanolab'' | |||
|'''25 nm/min on small samples on Si carrier''', ''Summer sanvis@nanolab'' | |||
|- | |||
|} | |||
<br clear="all" /> | |||
==Al2O3 etching by bghe@nanolab== | ==Al2O3 etching by bghe@nanolab== | ||