Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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DIRE01 INITIAL: PDEFBE, SUBDEFBE, CURRENT | DIRE01 INITIAL: PDEFBE, SUBDEFBE, CURRENT | ||
CYCLIC: CURRNT (every 5 minutes without interupting the writing of a field) | CYCLIC: CURRNT (every 5 minutes without interupting the writing of a field) | ||
</pre> | |||
The full list of calibration [[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Paths|paths are available here.]] | |||
== Alignment and global mark detection == | == Alignment and global mark detection == | ||