Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions
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*TiCl<sub>4</sub> | *TiCl<sub>4</sub> | ||
*H<sub>2</sub>O | *H<sub>2</sub>O | ||
*O<sub>3</sub> | *O<sub>3</sub> - Not available at the moment | ||
*O<sub>2</sub> | *O<sub>2</sub> | ||
*TEMAHf | *TEMAHf | ||