Specific Process Knowledge/Lithography/MiR: Difference between revisions
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==Exposure== | ==Exposure== | ||
During exposure using the maskless aligners MiR can be sensitive to dehydration by the air flow applied by the pneumatic auto-focus mechanism. This may lead to insufficient development, especially for small substrates. This problem can be alleviated by switching to the overview camera for a period of 1-2 minutes before starting the exposure. The effect can also be reduced by increasing the soft bake. | During exposure using the maskless aligners, MiR can be sensitive to dehydration by the air flow applied by the pneumatic auto-focus mechanism. This may lead to insufficient development, especially for small substrates. This problem can be alleviated by switching to the overview camera for a period of 1-2 minutes before starting the exposure. The effect can also be reduced by increasing the soft bake. | ||
==Post-exposure bake== | ==Post-exposure bake== | ||