Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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=Introduction= | =Introduction= | ||
== Electron scattering in resist and substrate == | |||
During exposure electrons will undergo scattering processes in the resist and in the substrate. | |||
== Beamer == | |||
The following is a short walkthrough of the most frequently used features of Beamer. For a more in depth look at Beamer please refer to GenISys own [[https://www.genisys-gmbh.com/in-action.html learning material found here.]] | |||
The BEAMER software is used to convert files from GDSII format to v30-format. The BEAMER software is manufactured by GenISys (www.genisys-gmbh.de) and the software is installed on the ebprep computer. | The BEAMER software is used to convert files from GDSII format to v30-format. The BEAMER software is manufactured by GenISys (www.genisys-gmbh.de) and the software is installed on the ebprep computer. | ||