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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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To accommodate most users, this tool uses developers: AR 600-546 for development of CSAR 6200 resist series and ZED N-50 for ZEP520A resists and IPA as a rinsing step.
To accommodate most users, this tool uses developers: AR 600-546 for development of CSAR 6200 resist series and ZED N-50 for ZEP520A resists and IPA as a rinsing step.
Intermediate results indicate that using ZED N-50 for CSAR 6200 series resist will introduce an elevated amount of residues, and vice verva for AR 600 - 546 used on ZEP 520A, but it is inconclusive.
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We therefore recommend to use:  
We recommend to use:  
*ZED N-50 for Zep520A
*ZED N-50 for ZEP520A
*AR 600-546 for CSAR 6200 series
*AR 600-546 for CSAR 6200 series


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