Specific Process Knowledge/Thermal Process/Oxidation/Dry oxidation C1 furnace: Difference between revisions
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The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated. | The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated. | ||
[[image:C1ThickVsSlot.pdf|300x300px|left|thumb|4" LPCVD nitride furnace (B2) located in cleanroom B-1]] | |||
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C1ThickVsSlot.pdf | |||
''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).'' | ''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).'' | ||