Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

Revision as of 09:29, 9 August 2022 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →System overview ← Older edit		Revision as of 09:30, 9 August 2022 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →System overview Newer edit →
Line 13:		Line 13:


	[[File:RaithHolders.png\|800px\|thumb\|~~right~~\|4 inch wafer holder and 100 mm Universal Sample Holder (USH)]]		[[File:RaithHolders.png\|800px\|thumb\|left\|4 inch wafer holder and 100 mm Universal Sample Holder (USH)]]

	Voltage - PEC		Voltage - PEC