Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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For EBL the system is a variable voltage exposure tool with a maximum acceleration voltage of 30 kV and beam currents from 0.01 to 12 nA. | For EBL the system is a variable voltage exposure tool with a maximum acceleration voltage of 30 kV and beam currents from 0.01 to 12.6 nA. The stage position is controlled by a laser interferometer and has a position accuracy of about 1 nm. | ||
Currently two holders are available, a 4" wafer holder and a 100 mm Universal Sample Holder (USH) for substrates up to about 75x75 mm. Chips can be clamped on either of the 8 chip clamps on the USH. The sample holders will rest on three ceramic balls on the stage, each ceramic ball fits into one of the kinematic mounts of the sample holder. The kinematic mounts are adjusted to keep the sample holder as level as possible. When handling the sample holders it is important not to touch the kinematic mounts. | |||