Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

@@ Line 14: / Line 14: @@
 {| border="2" cellspacing="1" cellpadding="1" align="center"
-! style="background:orange; color:black" colspan="8" | Typical beam current [pA] as function of acceleration voltage and aperture]
+! style="background:orange; color:black" colspan="8" | Typical beam current [pA] as function of acceleration voltage and aperture
 |- valign="top"
 ! style="background:silver; color:black" | Acc. voltage / Aperture
@@ Line 35: / Line 35: @@
 |- valign="top"
 ! style="background:Whitesmoke; color:black" | 10 kV HC
-! style="background:WhiteSmoke; color:black"| 0.02
+| style="background:WhiteSmoke; color:black"| 0.02
 | style="background:WhiteSmoke; color:black"| 0.05
 | style="background:WhiteSmoke; color:black"| 0.12