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Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 35: Line 35:
|- valign="top"
|- valign="top"
! style="background:Whitesmoke; color:black" | 10 kV HC
! style="background:Whitesmoke; color:black" | 10 kV HC
! style="background:WhiteSmoke; color:black"|
! style="background:WhiteSmoke; color:black"| 0.02
| style="background:WhiteSmoke; color:black"|  
| style="background:WhiteSmoke; color:black"| 0.05
| style="background:WhiteSmoke; color:black"|
| style="background:WhiteSmoke; color:black"| 0.12
| style="background:WhiteSmoke; color:black"|
| style="background:WhiteSmoke; color:black"| 0.20
| style="background:WhiteSmoke; color:black"|
| style="background:WhiteSmoke; color:black"| 0.39
| style="background:WhiteSmoke; color:black"|
| style="background:WhiteSmoke; color:black"| 1.96
| style="background:WhiteSmoke; color:black"|  
| style="background:WhiteSmoke; color:black"| 7.67
|}
|}


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