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Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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! style="background:silver; color:black" colspan="4" | Typical beam current [pA] as function of acceleration voltage and aperture]
! style="background:silver; color:black" colspan="4" | Typical beam current [pA] as function of acceleration voltage and aperture]
|- valign="top"
|- valign="top"
! style="background:silver; color:black" | Acc. voltage
! style="background:silver; color:black" | Acc. voltage / Aperture
! style="background:silver; color:black" | AR-P 6200.09 (180 nm)
! style="background:silver; color:black" | 10
! style="background:silver; color:black" | PMMA 950k
! style="background:silver; color:black" | 10 HC
! style="background:silver; color:black" | AR-N 8200.06
! style="background:silver; color:black" | 20
! style="background:silver; color:black" | 20 HC
! style="background:silver; color:black" | 30
! style="background:silver; color:black" | 30 HC
|- valign="top"
|- valign="top"
! style="background:lightgrey; color:black" | 10 kV
! style="background:lightgrey; color:black" | 10 kV