Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

@@ Line 13: / Line 13: @@
 Aperture and beam current (make own table)
-{| class="wiki table collapsible"
+{| border="2" cellspacing="1" cellpadding="1" align="center"
-! style="background:#808080" | Typical beam current
+! style="background:silver; color:black" colspan="4" | Typical beam current [pA] as function of acceleration voltage and aperture]
-! Bla
+|- valign="top"
-|-
+! style="background:silver; color:black" | Acc. voltage
-| 100 || 200 || 300
+! style="background:silver; color:black" | AR-P 6200.09 (180 nm)
+! style="background:silver; color:black" | PMMA 950k
+! style="background:silver; color:black" | AR-N 8200.06
+|- valign="top"
+! style="background:lightgrey; color:black" | 10 kV
+| style="background:lightgrey; color:black" | 30
+| style="background:lightgrey; color:black" | -
+| style="background:lightgrey; color:black" | -
+|- valign="top"
+! style="background:Whitesmoke; color:black" | 20 kV
+! style="background:WhiteSmoke; color:black" | 70
+| style="background:WhiteSmoke; color:black"| -
+| style="background:WhiteSmoke; color:black"| -
+|- valign="top"
+! style="background:lightgrey; color:black" | 30 kV
+| style="background:lightgrey; color:black" | 100
+| style="background:lightgrey; color:black" | -
+| style="background:lightgrey; color:black" | 180
 |}
@@ Line 77: / Line 94: @@
 | style="background:lightgrey; color:black" | -
 | style="background:lightgrey; color:black" | 180
 |}