Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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== System overview == | == System overview == | ||
The system is a dual use SEM and EBL exposure tool. For SEM applications the most notable difference from our other SEM's is the automation functionality that allows users to link a design to a substrate and simply inside the design define areas to image and the tool will then image those areas without further user input. Once an imaging routine has been setup several hundred images can be acquired per hour. For a brief introduction to this feature see more [https://youtu.be/YoZF_6FeVb4 in this video.] | The system is a dual use SEM and EBL exposure tool. For SEM applications the most notable difference from our other SEM's is the automation functionality that allows users to link a design to a substrate and simply inside the design define areas to image and the tool will then image those areas without further user input. Once an imaging routine has been setup several hundred images can be acquired per hour. For a brief introduction to this feature see more [https://youtu.be/YoZF_6FeVb4 in this video.] | ||
Sample holders and sample information | |||
Voltage - PEC | |||
Aperture and beam current (make own table) | |||
{| class="wiki table collapsible" | |||
! style="background:#808080" | Typical beam current | |||
! Bla | |||
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| 100 || 200 || 300 | |||
|} | |||
==Dose information== | ==Dose information== | ||