Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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=Process information for the Raith eLINE Plus system= | =Process information for the Raith eLINE Plus system= | ||
The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information. | The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information. | ||
== System overview == | |||
The system is a dual use SEM and EBL exposure tool. For SEM applications the most notable difference from our other SEM's is the automation functionality that allows users to link a design to a substrate and simply inside the design define areas to image and the tool will then image those areas without further user input. Once an imaging routine has been setup several hundred images can be acquired per hour. For a brief introduction to this feature see more in this video. | |||
==Dose information== | ==Dose information== | ||