Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table below. Writing time can be estimated in the software once a job is defined, it is however straight forward to estimate in advance based on area to pattern, A, dose to clear, d0, and beam current, I as: | Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table below. Writing time can be estimated in the software once a job is defined, it is however straight forward to estimate in advance based on area to pattern, A, dose to clear, d0, and beam current, I as: | ||
T = d0*A/I | T = d0*A/I | ||
Notice that this estimate is only the beam dwell time and does not account for beam settling time or stage movement time. Typically process times are 3-4 times higher than the dwell time estimate but this will vary with pattern and writing conditions. | |||
[[Image:CurrentAperture.png|800x800px|left|thumb|Typical beam currents as function of voltage and aperture.]] | [[Image:CurrentAperture.png|800x800px|left|thumb|Typical beam currents as function of voltage and aperture.]] | ||