Specific Process Knowledge/Lithography/ARN8200: Difference between revisions
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== Results at 30 kV (Raith eLINE) == | |||
A dose test is carried out with the following parameters | |||
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!colspan="5"|AR-N 8200 30 kV dose test, Processed by THOPE, AUG 2022 | |||
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!Resist | |||
!Spin Coat | |||
!E-beam exposure | |||
!PEB | |||
!Development | |||
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|AR-N8200.06 | |||
|LabSpin 2, 4000 rpm for 60s, softbake 10 min @ 150 degC, thickness is 120 nm | |||
|Raith eLINE Plus, 30 kV, 60 µm aperture, 168 pA | |||
|Labspin 2 hotplate 170 degC for 10 min | |||
|EBL development fumehood, 60 sec development in AR300-47:DIW (1:1), 30 sec rinse in DIW, nitrogen gun dry | |||
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