Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with ICP Metal: Difference between revisions
No edit summary |
|||
| Line 50: | Line 50: | ||
==Al2O3 etching by bghe@nanolab== | ==Al2O3 etching by bghe@nanolab== | ||
===Recipes=== | |||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | |||
|+ '''Al2O3 etch''' | |||
|- | |||
! Parameter | |||
! width="200" | Recipe 1:Al2O3 etch platen only | |||
|- | |||
! BCl<sub>3</sub> (sccm) | |||
| 15 | |||
|- | |||
! Ar (sccm) | |||
| 15 | |||
|- | |||
! Pressure (mTorr) | |||
| 5 | |||
|- | |||
! Coil power (W) | |||
| 0 | |||
|- | |||
! Platen power (W) | |||
| 30 | |||
|- | |||
! Temperature (<sup>o</sup>C) | |||
| 20 | |||
|- | |||
! Spacers (mm) | |||
| 100 mm | |||
|- | |||
|} | |||
===Results=== | |||