Specific Process Knowledge/Thin film deposition/Deposition of ITO: Difference between revisions
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* 0.5-2 nm/min | * 0.5-2 nm/min | ||
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* at least up to ~ 10 nm/min ([[Specific_Process_Knowledge/Thin_film_deposition/Sputtering of ITO in Sputter-System Metal-Oxide (PC1)|see conditions]]) | * at least up to ~ 10 nm/min ([[Specific_Process_Knowledge/Thin_film_deposition/Sputtering of ITO in Sputter-System Metal-Oxide (PC1)#Deposition_rate|see conditions]]) | ||
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