Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Defocus== | ==Defocus== | ||
Aligner: Maskless 02 offers two autofocus modes; optical or pneumatic. The autofocus mode is selected via the substrate template. The defocus process parameter is used to compensate for offsets between the autofocus mechanism and the focal point of the exposure light, and simultaneously optimize print quality in different resists and varying thicknesses. | Aligner: Maskless 02 offers two autofocus modes; optical or pneumatic <span style="color:red">(July 2022: The pneumatic AF has been disabled)</span>. The autofocus mode is selected via the substrate template. The defocus process parameter is used to compensate for offsets between the autofocus mechanism and the focal point of the exposure light, and simultaneously optimize print quality in different resists and varying thicknesses. | ||
'''Optical:''' Defocus varies greatly with resist type and thickness, see [[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing#Process_Parameters|Process Parameters]]. Probably also dependent on substrate. Should work for substrates down to 3x3mm<sup>2</sup>. | '''Optical:''' Defocus varies greatly with resist type and thickness, see [[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing#Process_Parameters|Process Parameters]]. Probably also dependent on substrate. Should work for substrates down to 3x3mm<sup>2</sup>. | ||
'''Pneumatic:''' Defocus is probably similar for resists of similar thickness, and not likely to vary with substrate. For 375nm exposure, the optimum seems to be around -15 to -10 ([[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing#Large_defocus_range|Large defocus range]]). Substrates must be at least 10x10mm<sup>2</sup> to be successfully loaded, probably larger to successfully print. | '''Pneumatic:''' Defocus is probably similar for resists of similar thickness, and not likely to vary with substrate. For 375nm exposure, the optimum seems to be around -15 to -10 ([[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing#Large_defocus_range|Large defocus range]]). Substrates must be at least 10x10mm<sup>2</sup> to be successfully loaded, probably larger to successfully print. <span style="color:red">(July 2022: The pneumatic AF has been disabled)</span> | ||
==Exposure mode== | ==Exposure mode== | ||