Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using Lesker sputter tool: Difference between revisions
| Line 75: | Line 75: | ||
<!-- --> | <!-- --> | ||
==Non reactive SiO<sub>2</sub> deposition from SiO<sub>2</sub> target== | ==Non-reactive SiO<sub>2</sub> deposition from SiO<sub>2</sub> target== | ||
SiO<sub>2</sub> can also be sputtered directly from SiO<sub>2</sub> target with RF bias assistance in the Sputter-System (Lesker). | SiO<sub>2</sub> can also be sputtered directly from SiO<sub>2</sub> target with RF bias assistance in the Sputter-System (Lesker). | ||