Specific Process Knowledge/Characterization/Profiler: Difference between revisions
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==Stylus Profiler (Tencor P17) == | ==Stylus Profiler (Tencor P17) == | ||
The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the Dektak XTA for profiling surfaces with structures in the micro- and submicrometer range as well as for measuring [[Specific_Process_Knowledge/Characterization/Stress_measurement|stress]]. Compared to the DektakXT, the P17 has more advanced options for stress measurements | The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the Dektak XTA for profiling surfaces with structures in the micro- and submicrometer range as well as for measuring [[Specific_Process_Knowledge/Characterization/Stress_measurement|stress]]. | ||
Compared to the DektakXT, the P17 has more advanced options for stress measurements: It allows the user to measure a stress map with up to 5° radial resolution. Programming and analyzing a sequence of predefined scans in fixed locations on a wafer is also easier and the manual for doing it much better for the P17 than for the DektakXT. A disadvantage of the P17 is that is can be hard to locate structures as the maximum field of view of the camera is 1x1.5 mm. We recommend having a map of the sample design available so you can easily locate the features of interest. Otherwise the P17 is easy to use, fast, and accurate, just like the DektakXT. | |||
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||
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*Acceptance measurements on the P17: [[Media:Appendix 3 Acceptance test p17 final_v2_Completed.pdf]] | *Acceptance measurements on the P17: [[Media:Appendix 3 Acceptance test p17 final_v2_Completed.pdf]] | ||
*Vendor's own conformity test results after installation: [[:File:Acceptance P17 ctd results.pdf]] | *Vendor's own conformity test results after installation: [[:File:Acceptance P17 ctd results.pdf]] | ||
Info about measurement accuracy can be found [[/Stylus profiler measurement uncertainty|here]]. | |||
===Equipment performance and process related parameters=== | ===Equipment performance and process related parameters=== | ||
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|style="background:LightGrey; color:black"|Resolution Z | |style="background:LightGrey; color:black"|Resolution Z | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.01 Å, 0.08 Å, or 0.6 Å according to the manufacturer for ranges 13 µm, 131 µm, and 1 mm. | 0.01 Å, 0.08 Å, or 0.6 Å according to the manufacturer for ranges 13 µm, 131 µm, and 1 mm. Note the smallest of these values are purely theoretical as they are far below the lab's noise level. | ||
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|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence) | |style="background:LightGrey; color:black"|Height accuracy z (95 % confidence) | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
~ 2 % for the smallest range for a 1 micron step and ~ 1 % for a 25 micron step '''for well-defined steps that are easy to measure''' | ~ 2 % for the smallest range for a 1 micron step and ~ 1 % for a 25 micron step '''for well-defined steps that are easy to measure''' (read about reducing and estimating the measurement uncertainty [[/Stylus profiler measurement uncertainty|here]]) | ||
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|style="background:LightGrey; color:black"|Max scan depth as a function of trench width W | |style="background:LightGrey; color:black"|Max scan depth as a function of trench width W | ||
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==Optical Profiler (Sensofar S Neox) == | ==Optical Profiler (Sensofar S Neox) == | ||
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The computer is not connected to the network but data can be saved on a dedicated USB and transfered to a computer on the network. | The computer is not connected to the network but data can be saved on a dedicated USB and transfered to a computer on the network. | ||
Info about measurement accuracy can be found [[/Stylus profiler measurement uncertainty|here]]. | |||
===Equipment performance and process related parameters=== | ===Equipment performance and process related parameters=== | ||