Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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[[Image:DoseChip6.png|300x300px|right|thumb|Overview image of the dose test design provided on the tool.]] | [[Image:DoseChip6.png|300x300px|right|thumb|Overview image of the dose test design provided on the tool.]] | ||
Table of dose to clear on Si substrate: | Table of dose to clear (area or curved elements) on Si substrate: | ||
{| border="2" cellspacing="1" cellpadding="1" align="center" | {| border="2" cellspacing="1" cellpadding="1" align="center" | ||