Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 7: Line 7:
[[Image:eLINE-Areas.png|800x800px|right|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]]
[[Image:eLINE-Areas.png|800x800px|right|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]]


The eLINE tool operates with four different dose types; area, curved elements, line and dot. The software allows the user to define different doses for the four different types of elements. The units used are:
The eLINE tool operates with four different design element types; area, curved elements, line and dot. The element types are classified as:
*Area: Polygons
*Curved elements: Elements that have an adjustable radius
Line: Zero-width line
Dot: Single point/vertice element
 
The software allows the user to define different doses for the four different types of elements and thus it is essential to know how the design is drawn and interpreted. The units used are:
   
   
*Area dose [µC/cm2],  
*Area dose [µC/cm2],  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/eLINE"