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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 43: Line 43:
|style="background:LightGrey; color:black"|Min. electron beam size
|style="background:LightGrey; color:black"|Min. electron beam size
|style="background:WhiteSmoke; color:black"|4 nm
|style="background:WhiteSmoke; color:black"|4 nm
|style="background:WhiteSmoke; color:black"|4 nm
|style="background:WhiteSmoke; color:black"|2 nm
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