Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

@@ Line 16: / Line 16: @@
 !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
 |style="background:silver; color:black;" align="left"|'''[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|JEOL JBX-9500FSZ]]'''
-|style="background:silver; color:black;" align="left"|'''[[Specific_Process_Knowledge/Lithography/EBeamLithography/eLINE]]'''
+|style="background:silver; color:black;" align="left"|'''[[Specific_Process_Knowledge/Lithography/EBeamLithography/eLINE|Raith eLINE Plus]]'''
 |-
@@ Line 27: / Line 27: @@
 |style="background:LightGrey; color:black"|Maximum writing area without stitching
 |style="background:WhiteSmoke; color:black"|1mm x 1mm
-|style="background:WhiteSmoke; color:black"|1mm x 1mm<sup>a</sup>
+|style="background:WhiteSmoke; color:black"|1mm x 1mm
 |-
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 |style="background:LightGrey; color:black"|Min. step size
 |style="background:WhiteSmoke; color:black"|1 nm
-|style="background:WhiteSmoke; color:black"|1 nm<sup>a</sup>
+|style="background:WhiteSmoke; color:black"|1 nm
 |-
 |style="background:LightGrey; color:black"|Beam current range
 |style="background:WhiteSmoke; color:black"|0.22 nA to 100 nA
-|style="background:WhiteSmoke; color:black"|0.01 to 12 nA<sup>a</sup>
+|style="background:WhiteSmoke; color:black"|0.01 to 12 nA
 |-