Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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[[Image:eLINE-Areas.png|800x800px|right|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]] | [[Image:eLINE-Areas.png|800x800px|right|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]] | ||
The eLINE tool operates with four different dose types | The eLINE tool operates with four different dose types; area, curved elements, line and dot. The software allows the user to define different doses for the four different types of elements. The units used are: | ||
*Area dose [µC/cm2], | *Area dose [µC/cm2], | ||
*Curved element dose [µC/cm2] | *Curved element dose [µC/cm2] | ||
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*Dot dose [pC]. | *Dot dose [pC]. | ||
Also notice that the unit prefix changes from micro to pico. We recommend setting the same dose for area and curved elements. | |||
The dose for each type can be setup under the "Patterning Parameter". Before updating the requested dose the beam current must be measured from the "Patterning Parameter" page. In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell time must then be updated by clicking the calculate icon next to the dwell time field. The dwell time will be calculated based on the last beam current measurement. | |||