Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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==Typical beam currents== | ==Typical beam currents== | ||
Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table | Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table below. Writing time can be estimated in the software once a job is defined, it is however straight forward to estimate in advance based on area to patter, A, dose to clear, d0 and beam current, I as: | ||
T = d0*A/I | |||
Equations in Labadviser?? | |||
[[Image:CurrentAperture.png|800x800px|left|thumb|Typical beam currents as function of voltage and aperture.]] | [[Image:CurrentAperture.png|800x800px|left|thumb|Typical beam currents as function of voltage and aperture.]] | ||
==Writing fields== | |||
Aspects of WF, dimension and resolution, step size | |||