Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

Revision as of 22:53, 17 June 2022 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Typical beam currents ← Older edit		Revision as of 20:56, 18 June 2022 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Typical beam currents Newer edit →
Line 53:		Line 53:
	Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table		Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table

	[[Image:CurrentAperture.png\|~~1000x1000px~~\|left\|thumb\|Typical beam currents as function of voltage and aperture.]]		[[Image:CurrentAperture.png\|800x800px\|left\|thumb\|Typical beam currents as function of voltage and aperture.]]