Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

Revision as of 22:53, 17 June 2022 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits No edit summary ← Older edit		Revision as of 22:53, 17 June 2022 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Typical beam currents Newer edit →
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	Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table		Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table

	[[Image:CurrentAperture.png\|~~500x500px~~\|~~right~~\|thumb\|~~Overview image~~ of ~~the dose test design provided on the tool~~.]]		[[Image:CurrentAperture.png\|1000x1000px\|left\|thumb\|Typical beam currents as function of voltage and aperture.]]