Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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We recommend all EBL users to do a dose test prior to exposing samples of significant value. As a starting point you can consider to use the Demo.csf provided on the tool. This pattern is available in the auto generated user folder. The pattern consist of areas, curved elements, lines and dots as shown below. LINK TO PAGE WITH MORE INFO. | We recommend all EBL users to do a dose test prior to exposing samples of significant value. As a starting point you can consider to use the Demo.csf provided on the tool. This pattern is available in the auto generated user folder. The pattern consist of areas, curved elements, lines and dots as shown below. LINK TO PAGE WITH MORE INFO. | ||
[[ | [[Image:DoseChip6.png|800x800px|right|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]] | ||
Table of dose to clear on Si substrate: | Table of dose to clear on Si substrate: | ||