Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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===Process information for the Raith eLINE Plus system=== | ===Process information for the Raith eLINE Plus system=== | ||
The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information. | The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information. | ||
[[Image:eLINE-Areas.png|800x800px|right|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]] | |||
==Dose information== | ==Dose information== | ||
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*Line dose [pC/cm] | *Line dose [pC/cm] | ||
*Dot dose [pC]. | *Dot dose [pC]. | ||
Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup under the "Patterning Parameter". Before updating the requested dose the beam current must be measured from the "Patterning Parameter" page. In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell time must then be updated by clicking the calculate icon next to the dwell time field. The dwell time will be calculated based on the last beam current measurement. | Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup under the "Patterning Parameter". Before updating the requested dose the beam current must be measured from the "Patterning Parameter" page. In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell time must then be updated by clicking the calculate icon next to the dwell time field. The dwell time will be calculated based on the last beam current measurement. | ||