Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
| Line 13: | Line 13: | ||
Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup under the "Patterning Parameter", see image below. Before updating the requested dose the beam current must be measured from the "Patterning Parameter" page. In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell time must then be updated by clicking the calculate icon next to the dwell time field. The dwell time will be calculated based on the last beam current measurement. | Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup under the "Patterning Parameter", see image below. Before updating the requested dose the beam current must be measured from the "Patterning Parameter" page. In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell time must then be updated by clicking the calculate icon next to the dwell time field. The dwell time will be calculated based on the last beam current measurement. | ||
[[Image | |||
[[Image:eLINE-Areas.png|600x600px|left|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]] | |||