Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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Table of dose to clear on Si substrate:
Table of dose to clear on Si substrate:
! colspan="3" style="text-align: center;" | Anneal Oxide


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Revision as of 07:51, 13 June 2022

THIS PAGE IS UNDER CONSTRUCTION

Process information for the Raith eLINE Plus system

The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information.

Dose information

Table of dose to clear on Si substrate:

Dose [µC/cm2]
Acc. voltage AR-P 6200.09 (180 nm) PMMA 950k AR-N 8200.xx
10 kV 30
20 kV 70
30 kV 100
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