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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,915 edits
Line 134: Line 134:
| 2021-03-23<br>jehem
| 2021-03-23<br>jehem
| 1.5 µm
| 1.5 µm
| 375
| 405
| Optical
| Pneumatic
| Quality
| Quality
| 70 mJ/cm<sup>2</sup>
| 70 mJ/cm<sup>2</sup>
Line 149: Line 149:
| 2021-11-25<br>jehem
| 2021-11-25<br>jehem
| 2.2 µm
| 2.2 µm
| 375
| 405
| Optical
| Pneumatic
| Quality
| Quality
| 10 mJ/cm<sup>2</sup>
| 10 mJ/cm<sup>2</sup>
Line 163: Line 163:
| 2021-08-25<br>jehem
| 2021-08-25<br>jehem
| 1.5 µm
| 1.5 µm
| 375
| 405
| Optical
| Pneumatic
| Quality
| Quality
| 175 mJ/cm<sup>2</sup>
| 175 mJ/cm<sup>2</sup>
Line 177: Line 177:
| 2021-12-08<br>jehem
| 2021-12-08<br>jehem
| 10 µm
| 10 µm
| 375
| 405
| Optical
| Pneumatic
| Quality
| Quality
| 550 mJ/cm<sup>2</sup>
| 550 mJ/cm<sup>2</sup>
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