Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 217: | Line 217: | ||
|} | |} | ||
<br> | |||
'''Dehydration reducing measures used for testing AZ MiR 701:'''<br> | |||
The CDA used for the pneumatic autofocus will dehydrate the resist. To reduce this effect, the writehead is parked far away from the write area while setting up the job for at least a few minutes, before starting the exposure. | |||