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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,893 edits
Line 127: Line 127:
| 350 mJ/cm<sup>2</sup>
| 350 mJ/cm<sup>2</sup>
| 0
| 0
| 1 µm (not optimized)
| 1 µm
| PEB: 120s@110°C, Dev: SP60s
| PEB: 120s@110°C, Dev: SP60s
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
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